English
Thin Film Deposition
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Single and multi-layers and films with thicknesses as low as 10 nm can be formed by sputtering methods. Highly regular nanostructures of emitting nanocrystals, metallic and ceramic nanoclusters can be created by exploiting self-assembly methods. Light emitting devices can also be fabricated by layer by layer deposition. Etching methods specially adapted for noble metals which have applications e. g. in heating elements, Pt electrodes and temperature sensors. |
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Installation(Click to open/download PDF file) |
Partner |
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| DLI-MOCVD | CEA |
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| FB-MOCVD | CEA | |||
| Micro Electroforming | KIT |
New in 4th Call! *) |
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| Noble Metal | MiPlaza | |||
| Optical Coatings | MiPlaza | |||
| PVD Cluster for Metals, Ceramic and Glass |
KIT | *) | ||
| PVD Cluster for Organic Device Fabrication |
CRF | |||
| Self Assembly Tools | CRF | |||
| Sol-gel: Dip and Spin Coating | CEA | New in 4th Call! |
*) new phone numbers in 2011



