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Thin Film Deposition

Single and multi-layers and films with thicknesses as low as 10 nm can be formed by sputtering methods. Highly regular nanostructures of emitting nanocrystals, metallic and ceramic nanoclusters can be created by exploiting self-assembly methods. Light emitting devices can also be fabricated by layer by layer deposition. Etching methods specially adapted for noble metals which have applications e. g. in heating elements, Pt electrodes and temperature sensors.

# Installation Membre
1 CVD CEA
2 DLI - MOCVD CEA
3 Electroforming KIT
4 High Precision 3D Dispensing and Printing IPA
5 Noble Metal MiPlaza
6 Optical Coatings MiPlaza
7 PVD CEA
8 PVD Cluster KIT
9 PVD-Cluster for organic device fabrication CRF
10 Self Assembly Tools CRF
11 SOL GEL, Dip-Coating & Spin-Coating CEA
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